Multiple comparisons of the mean rotational resistance of vinylpolysiloxane (Group IA), polyether (Group IB), vinylsiloxanether (Group IC) impression materials in implant impression using Post-hoc Tukey HSD analysis
| Groups | Mean (N·cm) | Standard deviation | P-value |
|---|---|---|---|
| Group IA | 9.46 | >0.01 | <0.01 |
| Group IB | 7.94 | >0.01 | |
| Group IB | 7.94 | >0.01 | <0.01 |
| Group IC | 3.72 | >0.01 | |
| Group IC | 3.72 | >0.01 | <0.01 |
| Group IA | 9.46 | >0.01 |
*P<0.05, statistically significant.